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Patents listed here reflect only technologies patented from FY 2018-present. To view all of NIST's patented technologies, visit the NIST pages on the Federal Laboratory Consortium website.
Provided herein are methods and apparatus for characterizing high aspect ratio (HAR) structures of fabricated or partially fabricated semiconductor devices. The methods involve using small angle X-ray scattering (SAXS) to determine average parameters of an array of HAR structures. In some