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Search Publications by: Thomas B. Lucatorto (Assoc)

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Displaying 51 - 75 of 228

Optics for Extreme Ultraviolet Lithography

November 1, 2005
Author(s)
Steven E. Grantham, Charles S. Tarrio, Shannon B. Hill, Thomas B. Lucatorto
Extreme Ultraviolet Lithography (EUVL) is considered by many to be the next generation lithography that will fabricate integrated circuits in the next decade. Although EUVL is conceptually similar to optical or deep-UV lithography, it represents a major

Improved Radiometry For Extreme-Ultraviolet Lithography

November 1, 2004
Author(s)
Charles S. Tarrio, Robert E. Vest, Steven E. Grantham, K Liu, Thomas B. Lucatorto, Ping-Shine Shaw
The absolute cryogenic radiometer (ACR), an electrical-substitution-based detector, is the most accurate method for measurement of radiant power in the extreme ultraviolet. At the National Institute of Standards and Technology, ACR-based measurements are

Facility for Pulsed Extreme Ultraviolet Detector Calibration

October 8, 2003
Author(s)
Steven E. Grantham, Robert E. Vest, Charles S. Tarrio, Thomas B. Lucatorto
All of the Extreme Ultraviolet light sources currently under consideration for Extreme Ultraviolet lithography are based on plasmas that emit radiation with a wavelength of approximately 13.4 nm. These sources whether they are produced by a discharge or

Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography

July 1, 2003
Author(s)
Charles S. Tarrio, S Grantham, M B. Squires, Robert E. Vest, Thomas B. Lucatorto
Currently the most demanding application of extreme ultraviolet optics is connected with the development of extreme ultraviolet lithography. Not only does each of the Mo/Si multilayer EUV stepper mirrors require the highest attainable reflectivity at 13 nm

Facility for Extreme Ultraviolet Reflectometry of Lithography Optics

February 1, 2003
Author(s)
Charles S. Tarrio, S Grantham, Thomas B. Lucatorto
Currently the most demanding application of extreme-ultraviolet (EUV) optics is in lithography. A commercial extreme-ultraviolet stepper will likely have six or more normal-incidence reflective optics, and the largest of these will be tens of cm in

Characterisation of the Response of Chromium-Doped Alumina Screens in the Vacuum Ultraviolet Using Synchrotron Radiation

December 1, 2002
Author(s)
James K. McCarthy, A Baciero, B Zurro, Uwe Arp, Charles Tarrio, Thomas B. Lucatorto, A Morono, P Martin, E R. Hodgson
We have measured the response of chromium-doped alumina screens to vacuum ultraviolet radiation and derived quantum efficiency curves for the energy range from 30 to 300 eV. A model is presented to explain the structure in this curve. In addition, the

First Results From the Updated NIST/DARPA EUV Reflectometry Facility

July 1, 2002
Author(s)
S Grantham, Charles Tarrio, M B. Squires, Thomas B. Lucatorto
Currently the most demanding application of extreme-ultraviolet (EUV) optics is in lithography. A commercial extreme-ultraviolet stepper will likely have six or more normal-incidence reflective optics, and the largest of these will be tens of cm in

Studies of Intensity Noise at Synchrotron Ultraviolet Radiation Facility III

March 1, 2002
Author(s)
Uwe Arp, Thomas B. Lucatorto, K Harkay, K Kim
Suppression of beam instabilities has become an important goal at synchrotron radiation light sources, where highly sensitive applications like metrology, Fourier--transform spectroscopy and microscopy are now in use. We describe measurements connecting