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Search Publications by: James K. Olthoff (Assoc)

Displaying 76 - 100 of 272

Ion Energy Distributions and Sheath Voltages in Radio-Frequency-Biased, Inductively Coupled, High-Density Plasma Reactor

April 1, 1999

Author(s)

Mark A. Sobolewski, James K. Olthoff, Yicheng Wang

Ion Energy Distributions and Sheath Voltages in Radio-Frequency-Biased, Inductively-Coupled, High-Density Plasma Reactor

April 1, 1999

Author(s)

Mark A. Sobolewski, James K. Olthoff, Yicheng Wang

Ion energy distributions were measured at a grounded surface in an inductively-coupled, high-density plasma reactor for pure argon, argon-helium, and argon-xenon discharges at 1.33 Pa (10 mTorr), as a function of radio-frequency (rf) bias amplitude, rf

Kinetic-energy Distributions of Positive and Negative Ions in Townsend Discharges in Oxygen

April 1, 1999

Author(s)

MVVS. Rao, Richard J. Van Brunt, James K. Olthoff

Translational flux-energy distributions of positive and negative ions have been measured at high electric field-to-gas density ratios (E/N) up to 40 x 10 -18 V m 2 (40 kTd) in diffuse, parallel-plate Townsend discharges in oxygen using an ion energy

Ion-Molecule Reactions and Ion Kinetics in DC Townsend Discharges in Dielectric Gases

January 1, 1999

Author(s)

MVVS. Rao, James K. Olthoff

The transport of positive and negative ions plays an important role in the initiation and behavior of discharges in gaseous dielectrics. In many cases, the identities, intensities, and kinetic energies of ions are determined by ion-molecule collisions

Total Electron Scattering Cross Section for Cl 2

January 1, 1999

Author(s)

Gary D. Cooper, Jason E. Sanabia, J. H. Moore, James K. Olthoff, Loucas G. Christophorou

Absolute measurements of the total electron scattering cross section for chlorine, Cl2, are reported for electron energies ranging from .3 eV to 23 eV. The present data are in reasonable agreement with previous measurements of the cross sections for total

A Search for Possible 'Universal-Applications' Gas Mixtures

December 1, 1998

Author(s)

Loucas G. Christophorou, James K. Olthoff, David S. Green

In an effort to respond to the recent concerns over the possible impact of SF 6 on global warming, we have searched for an SF 6 substitute gas that could be used in high voltage equipment instead of pure SF 6, with minimal changes in practice, operation

Applications of Electron-Interaction Reference Data to the Semiconductor Industry

December 1, 1998

Author(s)

Loucas G. Christophorou, James K. Olthoff

Many advanced plasma diagnostic techniques and plasma models require fundamental physical data in order to make accurate measurements or predictions. Fundamental electron-interaction data are among the most critical since electron collisions are the

Electron Drift Velocities and Electron Attachment Coefficients in Pure CHF 3 , and its Mixtures with Argon

December 1, 1998

Author(s)

Yicheng Wang, Loucas G. Christophorou, James K. Olthoff, J. K. Verbrugge

Measurements are reported of (i) the electron drift velocity in pure trifluoromethane (CHF 3) gas and in its mixtures with argon, and (ii) electron attachment in pure CHF 3. The E/N dependence on the electron drift velocity in mixtures exhibits regions of

Conference Report: Gaseous Dielectrics VIII (Eighth International Symposium on Gaseous Dielectrics, Jun 2-5, 1998, Virginia Beach, VA)

September 1, 1998

Author(s)

Loucas G. Christophorou, James K. Olthoff

A brief conference report is given on the Eighth International Symposium on Gaseous Dielectrics. The meeting was held on June 2-5, 1998, at Virginia Beach, VA. It was attended by over 100 participants from 18 countries. Seventy-seven papers -- of which