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Search Publications by: Wen-Li Wu (Assoc)

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Displaying 301 - 325 of 386

Incoherent Neutron Scattering and the Dynamics of Confined Polycarbonate Films

January 1, 2002
Author(s)
Christopher L. Soles, Jack F. Douglas, Wen-Li Wu, Robert M. Dimeo
Incoherent elastic neutron scattering measurements are performed on thin (1015 to 75 ) polycarbonate films supported on Si wafers. The mean-square atomic displacement is determined by fitting the intensity data to the Debye-Waller factor and we find that

Structural Characterization of Porous Low-k SiOC Thin Films Using Novel X-Ray Porosimetry

January 1, 2002
Author(s)
H W. Kim, Wen-Li Wu, Barry J. Bauer, Eric K. Lin, J Y. Kim, Y H. Kim, V. J. Lee
A novel x-ray porosimetry measurement is used to characterize the structure and properties of porous low-k dielectric films after varying process conditions. We determine the film thickness, density depth profile, average density, wall density, and

Confinement Effects on the Spatial Extent of the Reaction Front in Ultrathin Chemically Amplified Photoresists

December 1, 2001
Author(s)
D L. Goldfarb, M Angelopoulos, Eric K. Lin, Ronald L. Jones, Christopher Soles, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Wen-Li Wu
Sub-100 nm lithography poses strict requirements on photoresist material properties and processing conditions to achieve necessary critical dimension (CD) control of patterned structures. As resist thickness and feature linewidth decrease, fundamental

Thin Film Confinement Effects on the Thermal Properties of Model Photoresist Polymers

December 1, 2001
Author(s)
Christopher L. Soles, Eric K. Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Ronald L. Jones, Wen-Li Wu, D L. Goldfarb, M Angelopoulos
The demand to print increasingly smaller microelectronic device features means that the thickness of the polymer films used in the lithographic processes must decrease. The thickness of these films is rapidly approaching the unperturbed dimensions of the

Probe Diffusion in Thin PS Free-Standing Films

November 1, 2001
Author(s)
Y Pu, H White, Miriam Rafailovich, J Sokolov, A Patel, Christopher C. White, Wen-Li Wu, V Zaitsev, S A. Schwarz
DSIMS was performed to determine the dynamics of thin free standing polystyrene films by investigating the probe diffusion in high molecular weight polymer matrix. It is found that the temperature dependence of the diffusion of small molecular probes can

X-Ray Reflectivity and FTIR Measurements of N2 Plasma Effects on the Density Profile of Hydrogen Silsesquioxane Thin Films

October 1, 2001
Author(s)
V. J. Lee, C G. Chao, Eric K. Lin, Wen-Li Wu, B M. Fanconi, J K. Lan, Y L. Cheng, H C. Liou, Y L. Wang, M S. Feng
Non-destructive, specular X-ray reflectivity (SXR) measurements were used to investigate N2 plasma effects on the density depth profile of hydrogen silsesquioxane (HSQ) thin films. The SXR data indicate that the density profile of an HSQ film without

Measuring T g in Ultra-Thin Polymer Films With an Excimer Fluorescence Technique

September 1, 2001
Author(s)
Christopher C. White, Kalman D. Migler, Wen-Li Wu
An excimer fluorescence technique has been applied to the measurement of T g of ultra-thin polystyrene films. This technique utilizes an excimer-forming molecule with fluorescent emission in two wavelength bands. The intensity ratio of these bands is a

Characterization of Thin and Ultrathin Polymer and Resist Films

August 1, 2001
Author(s)
D L. Goldfarb, Q Lin, M Angelopoulos, Christopher Soles, Eric K. Lin, Wen-Li Wu
The need for a better understanding of the physicochemical properties of radiation-sensitive thin polymer coatings for lithographic applications is driven by the trend of ever-shrinking pattern dimensions and film thickness, imposed by the semiconductor