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Search Publications by: Wen-Li Wu ()

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Displaying 326 - 350 of 386

Polymer Chain Relaxation: Surface Outpaces Bulk

July 1, 2001
Author(s)
William E. Wallace, Daniel A. Fischer, K Efimenko, Wen-Li Wu, Jan Genzer
In this work we show how carbon near-edge X-ray absorption fine structure (NEXAFS) can be applied to detect both surface and bulk segmental relaxation in uniaxially deformed polystyrene samples. We demonstrate that by simultaneously monitoring the partial

Structure and Property Characterization of Low-k Dielectric Porous Thin Films

April 1, 2001
Author(s)
Barry J. Bauer, Eric K. Lin, V. J. Lee, Haonan Wang, Wen-Li Wu
High-resolution X-ray reflectivity and small angle neutron scattering measurements are used as complementary techniques to characterize the structure and properties of porous thin films for use as low-k interlevel dielectric (ILD) materials. With the

Abstracts for the MSEL Assessment Panel, March 2001

January 26, 2001
Author(s)
Leslie E. Smith, Alamgir Karim, Leonid A. Bendersky, C Lu, J J. Scott, Ichiro Takeuchi, Kathleen M. Flynn, Vinod K. Tewary, Davor Balzar, G A. Alers, Stephen E. Russek, Charles C. Han, Haonan Wang, William E. Wallace, Daniel A. Fischer, K Efimenko, Wen-Li Wu, Jan Genzer, Joseph C. Woicik, Thomas H. Gnaeupel-Herold, Henry J. Prask, Charles F. Majkrzak, Norman F. Berk, John G. Barker, Charles J. Glinka, Eric K. Lin, Ward L. Johnson, Paul R. Heyliger, David T. Read, R R. Keller, J Blendell, Grady S. White, Lin-Sien H. Lum, Eric J. Cockayne, Igor Levin, C E. Johnson, Maureen E. Williams, Gery R. Stafford, William J. Boettinger, Kil-Won Moon, Daniel Josell, Daniel Wheeler, Thomas P. Moffat, W H. Huber, Lee J. Richter, Clayton S. Yang, Robert D. Shull, R A. Fry, Robert D. McMichael, William F. Egelhoff Jr., Ursula R. Kattner, James A. Warren, Jonathan E. Guyer, Steven P. Mates, Stephen D. Ridder, Frank S. Biancaniello, D Basak, Jon C. Geist, Kalman D. Migler
Abstracts relating to research and development in the NIST Materials Science and Engineering Laboratory (MSEL) are presented for a poster session to be presented to the 2001 MSEL Assessment Panel.

Small-Angle Neutron Scattering Measurements of Nanoscale Lithographic Features

December 1, 2000
Author(s)
Wen-Li Wu, Eric K. Lin, Q Lin, M Angelopoulos
The continuing decrease in feature sizes in the semiconductor and other nanofabriation industries has placed increasingly stringent demands on current microscopy-based techniques to precisely measure both the critical dimensions and the quality (i.e. line