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Search Publications by: Wen-Li Wu (Assoc)

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Displaying 176 - 200 of 386

X-Ray and Neutron Porosimetry as Powerful Methodologies for Determining Structural Characteristics of Porous Low-k Thin Films

June 1, 2004
Author(s)
Hae-Jeong Lee, B D. Vogt, Christopher L. Soles, Da-Wei Liu, Barry J. Bauer, Wen-Li Wu, Eric K. Lin, Gwi-Gwon Kang, Min-Jin Ko
Methylsilsesquioxane based porous low-k dielectric films with varying porogen loading have been characterized using X-ray and neutron porosimetry to determine their pore size distribution, average density, wall density, porosity, density profiles, and

Fundamentals of Developer-Resist Interactions for Line-Edge Roughness and Critical Dimension Control in Model 248 nm and 157 nm Photoresists

May 1, 2004
Author(s)
Vivek M. Prabhu, M Wang, E Jablonski, B D. Vogt, Eric K. Lin, Wen-Li Wu, D L. Goldfarb, M Angelopoulos, H Ito
Organic polar solvent (1-butanol) versus aqueous base (tetramethylammonium hydroxide, (TMAH)) development quality are distinguished by neutral versus charged polymer (polyelectrolyte) dissolution behavior of photoresist bilayers on silicon substrates

Comparative Specular X-Ray Reflectivity, Positron Annihilation Lifetime Spectroscopy, and Incoherent Neutron Scattering Measurements of the Dynamics in Thin Polycarbonate Films

April 1, 2004
Author(s)
Christopher L. Soles, Jack F. Douglas, Wen-Li Wu, H G. Peng, D W. Gidley
The manner in which the dynamics of a polymer are affected by thin film confinement is one of technological significance, impacting thin film applications such as lubricants, adhesives, and chemically amplified photoresists. In this manuscript we use

Unusual Expansion and Contraction in Ultrathin Glassy Polycarbonate Films

April 1, 2004
Author(s)
Christopher L. Soles, Jack F. Douglas, Ronald L. Jones, Wen-Li Wu
The thermal expansion behavior and glass transitions of poly(styrene) (PS) and poly(methyl methacrylate) (PMMA) are extensively studied in the thin film geometry. Both PS and PMMA are similar in that they possess very low entanglement densities. In this

Brillouin Scattering Studies of Polymeric Nanostructures

March 1, 2004
Author(s)
R Hartschuh, A Mahorowala, Y Ding, J H. Roh, A Kisliuk, Alexei Sokolov, Christopher Soles, Ronald L. Jones, T J. Hu, Wen-Li Wu
Polymers are now being patterned into nanometer-sized features via optical and/or imprint lithography for a range of applications, including semiconductors, Micro-Electro- Mechanical systems (MEMS), and Nano-Electro-Mechanical systems (NEMS). In these

Water Absorption in Thin Photoresist Films

February 1, 2004
Author(s)
B D. Vogt, Christopher L. Soles, Ronald L. Jones, Vivek M. Prabhu, Wen-Li Wu, Eric K. Lin
In this work, we quantify deviations in the moisture absorption into model photoresist films upon changing thickness. Both the thermodynamics and kinetics of the absorption process are examined. Water in the resist films has been shown to have a