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Search Publications by: Wen-Li Wu (Assoc)

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Displaying 201 - 225 of 386

Small Angle X-Ray Scattering for Sub-100 nm Pattern Characterization

November 1, 2003
Author(s)
Ronald L. Jones, T Hu, Eric K. Lin, Wen-Li Wu, R Kolb, D Casa, P J. Bolton, G G. Barclay
The characterization of sub-100 nm photolithographic patterns with nanometer scale resolution is demonstrated using Small Angle X-ray Scattering (SAXS). The transmission scattering geometry employed is capable of high throughput measurements with

Interdiffision in Polystyrene and End-Functional Polystyrene Thin Films Near a Solid Surface

September 10, 2003
Author(s)
Chengqing C. Wang, Vivek M. Prabhu, Christopher L. Soles, B D. Vogt, Wen-Li Wu, Eric K. Lin, Sushil K. Satija
Polymer interdiffusion near the polymer/solid interface is studied using neutron reflectometry. Bilayers of hydrogenated polystyrene (hPS) and deuterated polystyrene (dPS) or hydrogenated dicarboxy terminated polystyrene (hPS(COOH)2) and dPS are prepared

3-Dimensional Lineshape Metrology Using Small Angle X-ray Scattering

September 1, 2003
Author(s)
Ronald L. Jones, T J. Hu, Eric K. Lin, Wen-Li Wu, D M. Casa, G G. Barclay
The need for sub-nanometer precision metrology of dense patterns for future technology nodes challenges current methods based on light scatterometry, scanning electron microscopy (SEM), and atomic force microscopy (AFM). We provide results of initial tests

A Direct Comparison of Surface and Bulk Chain-Relaxation in Polystyrene

September 1, 2003
Author(s)
Wen-Li Wu, S Sambasivan, C M. Wang, William E. Wallace, Jan Genzer, Daniel A. Fischer
Near-edge x-ray absorption fine structure (NEXAFS) spectroscopy was used to meausre simultaneously the relaxation rates of polystyrene (PS) molecules at the free surface and in the bulk. The samples were uniaxially stretched and annealed at temperatures

Confinement Effects on Mositure Absorption Kinetics in Polyelectrolyte Films

September 1, 2003
Author(s)
B D. Vogt, Christopher L. Soles, Hae-Jeong Lee, Eric K. Lin, Wen-Li Wu
Quartz crystal microbalance (QCM) measurements were used to determine the absorption of water into thin poly(4-ammonium styrenesulfonic acid) films from saturated vapor at 25 C. The effect of film thickness on the absorption kinetics was investigated in

Fast Evaluation of Next-Generation Lithographical Patterns by Small Angle X-Ray Scattering

September 1, 2003
Author(s)
T Hu, Ronald L. Jones, Wen-Li Wu, Christopher L. Soles, Eric K. Lin, M Arpan, D M. Casa
As the semiconductor industry moves to next-generation lithographies, evaluation of the patterns is more stringent. We demonstrate the capability of small angel X-ray scattering in a fast evaluation of periodicity, size of the patterns, average profile of

Form of Deprotection in Chemically Amplified Resists

September 1, 2003
Author(s)
Ronald L. Jones, T J. Hu, Vivek M. Prabhu, Christopher L. Soles, Eric K. Lin, Wen-Li Wu, D L. Goldfarb, M Angelopoulos
The push to mass production of patterns with sub-100 nm dimensions will require nanometer level control of feature size, including line edge roughness (LER). Control of LER and sidewall roughness within the length scale of individual molecules requires a

Interdiffusion in Polystyrene and End-Functional Polystyrene Thin Films Near a Solid Surface

September 1, 2003
Author(s)
C M. Wang, Vivek Prabhu, Christopher Soles, B D. Vogt, Wen-Li Wu, Eric K. Lin, Sushil K. Satija
Polymer interdiffusion near the polymer/solid interface is studied using neutron reflectometry. Bilayers of hydrogenated polystyrene (hPS) and deuterated polystyrene (dPS) or hydrogenated dicarboxy terminated polystyrene (hPS(COOH)2) and dPS are prepared

NEXAFS Measurements of the Surface Chemistry of Chemically Amplified Photoresists

September 1, 2003
Author(s)
E Jablonski, M Angelopoulos, H Ito, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, S Sambasivan, Daniel A. Fischer, Ronald L. Jones, Eric K. Lin, Wen-Li Wu, D L. Goldfarb, K Temple
Near edge x-ray absorption fine structure (NEXAFS) spectroscopy was used to quantify the surface composition profile (top 1 nm to 6 nm) of model chemically amplified photoresists with various photo-acid generators. These materials are prone to interfacial

Polyelectrolyte Effects in Model Photoresist Developer Solutions

August 1, 2003
Author(s)
Vivek M. Prabhu, Ronald L. Jones, Eric K. Lin, Wen-Li Wu
We demonstrate that the industrially relevant deprotected photoresist poly(4-hydroxy styrene) is a polyelectrolyte when dissolved in aqueous base solutions. These findings demonstrate the well-known monomer-monomer correlations indicative of

Combinatorial Edge Delamination Test for Thin Film Adhesion Concept, Procedure, Results

July 1, 2003
Author(s)
Martin Y. Chiang, J He, R Song, Alamgir Karim, Wen-Li Wu, Eric J. Amis
A high-throughput combinatorial approach to edge delamination test is proposed to map the failure of adhesion as a function of both temperature and film thickness in a single step. In this approach, a single specimen of a thin film bonded to a substrate